Phosphor and method for producing same
US6337035B1 · kind B1 · utility
6Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 19, 1999 |
| Grant date | Jan 8, 2002 |
| Priority date | — |
| Expiry date | Feb 19, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2991
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A phosphor is prepared by depositing a compound semiconductor of Groups III-V in the form of fine particles or a thin film on a surface of a carrier particle by hetero-epitaxial growth. Thus, the phosphor increased in quality is obtained with satisfactory reproducibility.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.