Method and apparatus for forming thin functional film
US6337105B1 · kind B1 · utility
20Cited by
14References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 2000 |
| Grant date | Jan 8, 2002 |
| Priority date | — |
| Expiry date | Jan 11, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a method of forming a thin functional film by vacuum vapor deposition in which a functional material is heated from the above thereof so that bumping or splashing of the functional material is not caused upon evaporation of the functional material. Specifically, the functional material is placed in a receiving vessel and the functional material is heated by a heater which is located above the functional material so that bumping or splashing is suppressed, whereby a uniform functional film is produced without a pinhole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.