Process for applying a light-blocking layer between a photoconducting layer and a mirror when manufacturing an optically addressable spatial light modulator

US6338882B1 · kind B1 · utility

Assignee

• DEUTSCHE TELEKOM AG · DE

Inventors

• Wolfgang Dultz · Frankfurt am Main, DE
• Wolfgang Haase · Reinheim, DE
• Leonid A. Beresnev · Dayton, US
• Elena Konshina · Saint Petersburg, RU
• Arkadii Onokhov · Saint Petersburg, RU

Key dates

• Filing date: Mar 23, 2000
• Grant date: Jan 15, 2002
• Expiry date: Mar 23, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G02F2202/104
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for applying a light-blocking layer between a photoconducting layer and a mirror when making an optically addressable spatial light modulator (OASLM) using a chemical vapor deposition process. The light-blocking layer and the photoconducting layer are applied in a shared process step in which both the thickness and composition of the photoconducting layer to be applied to the transparent electrode, as well as the thickness and composition of the light-blocking layer to be applied to the photoconducting layer are determined by a time-related change of the variation of the gas composition during the deposition process. The structure of the OASLM can be optimally adapted to a desired purpose.