Method of fabricating a semiconducting thin film of polymer with improved chain ordering by drying in solvent rich atmosphere
US6339012B1 · kind B1 · utility
Inventors
Key dates
| Filing date | Nov 29, 1999 |
| Grant date | Jan 15, 2002 |
| Priority date | — |
| Expiry date | Nov 29, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/0486
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method for fabricating a thin film of polymer, particularly a semiconducting thin film of polymer with an improved structural order, wherein the thin film is formed by deposition of a polymer material onto a solid substrate material from a polymer solution formed by means of a solvent, the polymer solution is provided in a closed container such that a free volume is left in the container above the polymer solution and the substrate material immersed in the solution, whereupon the substrate material with a thin film deposited thereon is withdrawn from the polymer solution with a withdrawal speed being selected dependent on the concentration of the polymer solution, until the substrate material is located in the free volume a certain distance above the polymer solution. The substrate material is kept in vertical position in the free volume while the solvent evaporates, whereupon the substrate material with the thin film is removed from the container for further drying in a vacuum oven.—Use in fabrication of organic thin-film transistors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.