Fabrication of photonic band gap materials
US6339030B1 · kind B1 · utility
29Cited by
14References
14Claims
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Key dates
| Filing date | Jan 5, 2000 |
| Grant date | Jan 15, 2002 |
| Priority date | — |
| Expiry date | Jan 5, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/918
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for forming a periodic dielectric structure exhibiting photonic band gap effects includes forming a slurry of a nano-crystalline ceramic dielectric or semiconductor material and monodisperse polymer microspheres, depositing a film of the slurry on a substrate, drying the film, and calcining the film to remove the polymer microspheres therefrom. The film may be cold-pressed after drying and prior to calcining. The ceramic dielectric or semiconductor material may be titania, and the polymer microspheres may be polystyrene microspheres.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.