MOCVD precursors based on organometalloid ligands
US6340768B1 · kind B1 · utility
7Cited by
10References
27Claims
0Family size
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Inventors
Key dates
| Filing date | Dec 4, 2000 |
| Grant date | Jan 22, 2002 |
| Priority date | — |
| Expiry date | Dec 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/891
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Volatile metal complexes with &agr;-sila-&bgr;-diketonate ligands containing haloalkyl, and particularly, perfluoroalkyl, substitutents are useful as metal precursors for chemical vapor deposition processes and as nanostructured materials containing fluorous domains.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.