Projection eyepiece and method for aligning pattern areas on opposing substrate
US6340821B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | May 28, 1999 |
| Grant date | Jan 22, 2002 |
| Priority date | — |
| Expiry date | May 28, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection eyepiece and method for aligning pattern areas on a substrate surface having a micro-optical device on an opposite surface side of the substrate is disclosed. The projection eyepiece enables projection of a reticle image onto a first surface of a substrate, enabling receipt of a reflection of that reticle image from a micro-optical device located on a second and opposing surface of the substrate, and enabling comparison of the projected and received image to determine alignment of the point of incidence on the first surface with the micro-optical device of the second surface. The projection eyepiece therefore determines alignment of pattern areas on opposing substrate surfaces by comparing a projected reticle image to a reflection of that projected reticle image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.