Laser delivery system and method for photolithographic mask repair
US6341009B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2000 |
| Grant date | Jan 22, 2002 |
| Priority date | — |
| Expiry date | Feb 24, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/0624
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system and method for photolithographic mask repair. The system includes a structure for supporting a mask to be operated on, a laser emitting device for effecting mask repair, a light source adjacent the support structure for selected illumination of the mask, a laser processor for effecting sequential angular manipulation of a laser beam projecting from the laser emitting device, a computer device for controlling the sequential angular manipulation so as to capture a generally complete waveform of the beam, and a microscope for multi-aspect viewing of the mask during navigation of the beam about the mask. The computer device, simultaneously with manipulation of the beam, effecting fine motion control of the beam, controlled movement of the motorized aperture for effecting the sequential angular manipulation, controlled support structure movement, and image data processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.