Photosensitive compositions and pattern formation method
US6342330B2 · kind B2 · utility
4Cited by
10References
8Claims
0Family size
Assignees
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Key dates
| Filing date | Jan 2, 2001 |
| Grant date | Jan 29, 2002 |
| Priority date | — |
| Expiry date | Jan 2, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.