Feed device for large amount of semiconductor process gas
US6343627B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 3, 2000 |
| Grant date | Feb 5, 2002 |
| Priority date | — |
| Expiry date | May 3, 2020 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF17C2270/0518
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
An apparatus for supplying a semiconductor process gas charged in a large-capacity gas vessel to a plant where the gas is used, after reduction of the pressure of the gas. The gas cylinder 21 is composed essentially of a cylindrical portion 22 and hemispherical portions 23 and 24 formed at the ends of the cylindrical portion respectively. The gas cylinder 21 has a gas charge port 26 at one hemispherical portion and a gas discharge port 27 at the other hemispherical portion both of which opening in alignment with the axis 25 of the cylindrical portion 22. A charge valve 28 and a gas discharge unit 29 having at least a gas vessel valve 30 and a pressure reducing valve 32 are connected to the gas charge port and the gas discharge port respectively. The gas cylinder 21 is housed together with the charge valve 28 and the gas discharge unit 29 in a container 36.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.