Photosensitive resin composition
US6344307B1 · kind B1 · utility
8Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2000 |
| Grant date | Feb 5, 2002 |
| Priority date | — |
| Expiry date | Oct 13, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition characterized by comprising (A) a resin having at least one aprotic onium salt represented by the general formula:—COO−·W+  (1)and/or the general formula: (in each of the above general formulas, W+ represents wherein, Z represents a nitrogen atom or phosphorus atom; Y represents a sulfur atom; R1, R2, R3 and R4 each represents an organic group having 1 to 30 carbon atoms), (B) a compound having two or more vinylether groups in a molecule and (C) a compound which generates an acid upon irradiation with actinic energy rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.