Heat-developable photosensitive material
US6344313B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2000 |
| Grant date | Feb 5, 2002 |
| Priority date | — |
| Expiry date | Mar 30, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/49845
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An object of the present invention is to provide a heat-developable photosensitive material of improved fluctuation of photographic performance (sensitivity, Dmin) arisen from fluctuation of development temperature condition (temperature, time) and storage time after heat development. According to the present invention, there is provided a heat-developable photosensitive material, wherein the photosensitive material comprises, on a support, an image-forming layer containing at least (a) non-photosensitive organic silver salt, (b) photosensitive silver halide, (c) a reducing agent, and (d) a binder, and a protective layer on the image-forming layer, polymer latexes are used as binders of the image-forming layer and the protective layer, and the photosensitive material further comprises, on the image-forming layer side, (e) a nucleating agent and (f) one or more compounds represented by the following formula (1): wherein, in the formula (1), Z1 and Z2 each independently represent a halogen atom, X1 represents a hydrogen atom or an electron withdrawing group, Y1 represents —CO— group or —SO2— group, Q represents an arylene group which may have a substituent or …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.