Photoreactive agent containing photoreactive semiconductor for removing harmful materials
US6346253B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 1997 |
| Grant date | Feb 12, 2002 |
| Priority date | — |
| Expiry date | Feb 28, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB60H2003/0691
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A photoreactive agent is provided for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing film-forming inorganic fine particles and a layer containing a water repellent which layers are formed in that order on at least one side of the substrate. The photor…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.