Electrophotosensitive material
US6346355B2 · kind B2 · utility
3Cited by
0References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2001 |
| Grant date | Feb 12, 2002 |
| Priority date | — |
| Expiry date | Mar 15, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/0609
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an electrophotosensitive material comprising a conductive substrate and a photosensitive layer formed on the substrate, the photosensitive layer containing a quinone derivative represented by the general formula (1): wherein R represents hydrogen atom or alkyl; Me represents methyl. The electrophotosensitive material has high sensitivity, since quinone derivative (1) has excellent electron acceptability, comparability with binder resin and matching with electric charge generating material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.