Semiconductor device with silicide contact structure and fabrication method thereof
US6346465B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2000 |
| Grant date | Feb 12, 2002 |
| Priority date | — |
| Expiry date | Jun 22, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76877
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A fabrication method of a semiconductor device that realizes a simplified contact formation process is provided. After a single-crystal silicon substrate having a main surface is provided, a dielectric film having a contact hole uncovering the main surface of the substrate is formed on the main surface of the substrate. Next, a silicon nitride film is formed on the main surface of the substrate in the contact hole of the dielectric film. Then, a metal film is formed on the dielectric film to be contacted with the silicon nitride film in the contact hole of the dielectric film. The metal film has a property that an atom of the metal film serves as diffusion species in a solid-phase silicidation reaction. The metal film, the silicon nitride film, the dielectric film, and the substrate are heat-treated to thereby form a metal silicide film due to a solid-phase silicidation reaction between the metal film and the substrate. The metal silicide film thus formed is contacted with the main surface of the substrate in the contact hole of the dielectric film. The metal silicide film has a single-crystal structure. Finally, an electrically conductive film is formed on the dielectric film to b…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.