Cleaning solution for electromaterials and method for using same
US6346505B1 · kind B1 · utility
16Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 1999 |
| Grant date | Feb 12, 2002 |
| Priority date | — |
| Expiry date | Jan 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/26
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning solution for electromaterials including hydrogen fluoride and either oxygen or hydrogen gas dissolved in water. The cleaning solution may alternatively include hydrogen fluoride, hydrochloric acid or nitric acid, and hydrogen or oxygen gas dissolved in water. Alternatively, the cleaning solution includes hydrogen fluoride, hydrogen peroxide and oxygen gas dissolved in water. The present invention also provides a method for cleaning electromaterials including applying an ultrasonic vibration to cleaning solution applied to electromaterials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.