RF/microwave energized plasma light source
US6348669B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2000 |
| Grant date | Feb 19, 2002 |
| Priority date | — |
| Expiry date | Nov 30, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/044
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus for radiating energy at one or more predetermined wavelength comprising: a housing (4), a source of microwave energy coupled to and located outside the housing and a window forming part of the wall of the housing, the window being formed from a material which is substantially transparent to radiation at the or each predetermined wavelength and at the wavelength of the microwave source, the window including gas of a predetermined composition at a predetermined pressure contained in a gas-tight enclosure (2) defined by the window material, the gas composition being chosen to emit energy at the or each predetermined wavelength in response to microwave energy from the housing (4) impinging generally on an inner surface of the window, the window being arranged substantially to be opaque at the wavelength of the microwave energy and being arranged to provide an unobstructed radiating path from its outer surface for the energy of the or each predetermined wavelength.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.