Method for producing porous diamond
US6350389B1 · kind B1 · utility
24Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 26, 1999 |
| Grant date | Feb 26, 2002 |
| Priority date | — |
| Expiry date | Mar 26, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing a porous diamond according to the present invention comprises steps of forming an anodized alumina layer, which functions as a mask, on a diamond substrate; and performing a plasma etching treatment to form pores on the diamond substrate, which pores have the same arrangement as those of the anodized alumina mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.