Method for decreasing CHC degradation
US6350673B1 · kind B1 · utility
0Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1999 |
| Grant date | Feb 26, 2002 |
| Priority date | — |
| Expiry date | Aug 12, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/958
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for decreasing CHC degradation is provided. The method includes providing a semiconductor device (10) having at least one metal layer (28) completed. Then, a planarizing dielectric layer (30) is added to the semiconductor device (10). The semiconductor device (10) is heated in a hydrogen rich environment until hydrogen completely saturates the semiconductor device (10).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.