Linear capacitor structure in a CMOS process
US6351020B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1999 |
| Grant date | Feb 26, 2002 |
| Priority date | — |
| Expiry date | Nov 12, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/212
Abstract
A cumulative capacitor structure with desirably constant capacitance characteristics is disclosed. In one embodiment, the cumulative capacitor includes a set of four capacitors coupled in parallel between first and second terminals of the cumulative capacitor. In one embodiment, the first capacitor is comprised of a top plate formed of an n-type polysilicon coupled to the first terminal, a bottom plate comprised of a first accumulation/depletion region such as an n-well region coupled to the second terminal, and a first dielectric region between its top and bottom plates. The second capacitor has an n-type polysilicon terminal top plate coupled to the second terminal, an accumulation/depletion region bottom plate coupled to the first terminal, and a dielectric between its top and bottom plate. A third capacitor has a p-type polysilicon top plate coupled to the first terminal, an accumulation/depletion region bottom plate coupled to the second terminal, and a third dielectric region between its top and bottom plates. The fourth capacitor has a p-type polysilicon terminal coupled to the second terminal, an accumulation/depletion region bottom plate coupled to the first terminal, and …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.