Patent · US Expired

Method and device for PVD coating

US6352627B2 · kind B2 · utility

8Cited by

6References

7Claims

0Family size

Assignee

Cemecon-Ceramic Metal Coatings · DE

Inventors

Antonius Leyendecker · Herzogenrath, DE
Georg Erkens · Aachen, DE
Stefan Esser · Aachen, DE
Hans-Gerd Fuss · Herzogenrath, DE
Bernd Hermeler · Aachen, DE
Rainer Wenke · Aachen, DE

Key dates

Filing date	Oct 14, 1999
Grant date	Mar 5, 2002
Priority date	—
Expiry date	Oct 14, 2019

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3444
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a PVD coating method and to a PVD coating device with a chamber in which at least one target cathode, at least one anode and at least one substrate holder which is intended to hold at least one substrate are arranged, and with a control device which delivers a first voltage in order to supply the target cathode with a negative electrical potential relative to the anode in order to form a plasma in which the substrate is arranged, and which delivers a second voltage in order to supply the anode with a positive electrical potential relative to the chamber wall. In this sputter-coating device, the ion fraction of the target material which can be achieved is too low for qualitatively satisfactory coating properties. It is increased according to the invention in that the control device delivers a third voltage which supplies the substrate with an electrical potential that is more negative than the potential of the anode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.