Monitoring materials
US6353230B1 · kind B1 · utility
Assignees
Inventors
Key dates
| Filing date | May 7, 1999 |
| Grant date | Mar 5, 2002 |
| Priority date | — |
| Expiry date | May 7, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01T1/185
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
The apparatus and method provide techniques for effectively implementing alpha and/or beta and/or gamma monitoring of items or locations as desired. Indirect alpha monitoring by detecting ions generated by alpha emissions, in conjunction with beta and/or gamma monitoring is provided. The invention additionally provides for screening of items prior to alpha monitoring using beta and/or gamma monitoring, so as to ensure that the alpha monitoring apparatus is not contaminated by proceeding direct to alpha monitoring of a heavily contaminated item or location.The invention provides additional versatility in the emission forms which can be monitored, whilst maintaining accuracy and avoiding inadvertent contamination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.