Automatic generation of one dimensional data compaction commands for electron beam lithography
US6353922B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 24, 1999 |
| Grant date | Mar 5, 2002 |
| Priority date | — |
| Expiry date | Aug 24, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30422
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method, and a system for employing the method, for compacting the amount of memory required to store a two dimensional array of exposure spot shapes in a numerically controlled (NC) electron beam lithography tool. The method includes the steps of: sorting the shapes in a selected line based on the widths and heights of the shapes; identifying and removing from contention a group of shapes in the selected line having common widths and heights; determining a dosage requirement for the shapes in the group; and applying one or more commands based on the group and the determined dosed requirement to enable the NC electron beam lithography tool to draw the two dimensional array of exposure spot shapes. Before the sorting step, the method can include initially selecting whether processing for the shapes is performed on a vertical line or on a horizontal line basis; and applying the sorting step, the identifying step, the determining step and the applying step on a basis not selected in the initially selecting step. The method can also include the steps of: preselecting a minimum number of required common shapes; and performing the identifying and removing step only if the number of shap…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.