Material for the removal of gaseous impurities from a gas mixture
US6355094B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 22, 2000 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Nov 22, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2220/58
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Porous, preferably dimensionally stable material and a method for using for the removal of gaseous impurities from a gas mixture, such as H2S, COS, CH2, and SO2, into the pores of which there is incorporated a secondary amine which chemically bonds with the constituents to be removed, with the material including a hydrophobic polymer with pores having an average diameter in the range of from 0.1 to 50 &mgr;m and a secondary amine having hydrophobic properties which optionally is incorporated into a hydrophobic liquid is disclosed. Favorable results have been attained using polypropylene as the hydrophobic polymer and ditridecyl amine as the secondary amine, with a tertiary amine, such as C12 to C14-alkyl diethanol amine, being part of the hydrophobic liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.