Process for producing planar waveguide structures as well as waveguide structure
US6356694B1 · kind B1 · utility
63Cited by
8References
4Claims
0Family size
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Key dates
| Filing date | Jul 14, 1999 |
| Grant date | Mar 12, 2002 |
| Priority date | — |
| Expiry date | Jul 14, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for producing a waveguide, wherein a first layer is deposited on a silicon or glass substrate, a core structure is subsequently structured, and the core structure is protected by a protective layer. Prior to each step for depositing a new layer, the layer that has just been applied is fluorinated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.