Marking diamond
US6358427B1 · kind B1 · utility
3Cited by
21References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2000 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Feb 9, 2020 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB28D5/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An invisible information mark is provided on a facet of a diamond gemstone by applying a plasma resist to the exposed surface of the gemstone, applying an electrically conducting layer of metal to the region where the information mark is to be formed, ablating a selected zone of the metal and resist layers by ultraviolet laser thus forming a mask on the surface of the facet, electrically connecting the metal layer and plasma etching the facet through the mask, thus forming a mark of appropriate depth on the surface of the gemstone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.