Oxide/organic polymer multilayer thin films deposited by chemical vapor deposition
US6358863B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1999 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Apr 30, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Multilayer thin films consisting of alternating layers of oxide and organic polymer dielectric materials are manufactured by chemical vapor deposition using a CVD apparatus comprising separate precursor volatilization/dissociation areas. Methods are described for the manufacture of multilayered films. The electrical properties of the multilayered films make the films of embodiments of this invention suitable for use as dielectric materials for semiconductor manufacture. The multilayered films of embodiments this invention reduce RC delay and cross-talk, thereby permitting increased density, higher frequency performance and greater reliability of semiconductor devices for use in the electronics industry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.