Centralized control architecture for a plasma arc system
US6359251B1 · kind B1 · utility
38Cited by
41References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2000 |
| Grant date | Mar 19, 2002 |
| Priority date | — |
| Expiry date | Apr 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/49353
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The invention features a centralized control architecture for a closely-coupled plasma arc system, in which the “intelligence” of the system is integrated into a single controller. The closely-coupled plasma arc system includes a power source, an automatic process controller and a torch-height controller, where each of these components individually has a closed-loop dynamic relationship with the controller.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.