Patent · US Expired

Antireflective coating and method of manufacturing same

US6359735B1 · kind B1 · utility

72Cited by
5References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 15, 1999
Grant dateMar 19, 2002
Priority date
Expiry dateSep 15, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/315
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

What is described here is an antireflective coating comprising a carrier layer consisting of an optically transparent material, which, at least on one surface side, presents antireflective properties with respect the wavelengths of the radiation incident on the surface. Moreover, methods of producing the coating are described.The invention excels itself by the provision that the antireflective surface side presents a surface roughness with stochastically distributed structures—the so-called macro structures—and that the macro structures are additionally modulated with surface structures presenting a periodic sequence—the so-called micro structures—which present period or cycle lengths smaller than the wave lengths of the radiation incident on the antireflective surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.