Patent · US Expired

Method for processing semiconductor material

US6360755B1 · kind B1 · utility

7Cited by

5References

8Claims

0Family size

Assignee

Wacker Chemie AG · DE

Inventors

Matthaus Schantz · Simbach, DE
Dirk Flottmann · Altötting, DE

Key dates

Filing date	Jul 28, 1999
Grant date	Mar 26, 2002
Priority date	—
Expiry date	Jul 28, 2019

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB02C2019/183
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method is for processing semiconductor material, in which one or more shock waves generated using a transducer are transmitted through a liquid medium to semiconductor material in rod form. The transducer is at a distance of from 1 cm to 100 cm from the semiconductor material, and the shock waves have a pulse energy of from 1 to 20 kJ and a pulse rise time to the energy maximum of from 1 to 5 &mgr;s.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.