CMP formulations
US6364920B1 · kind B1 · utility
5Cited by
3References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2000 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Apr 21, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09G1/02
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
CMP formulations comprising alumina particles and an iodate oxidizer can be stabilized against pH drift during use by acidification using an organic acid. Formulation pH stability can be further enhanced by treating the formulation at an elevated temperature before it is used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.