Programmable flux gradient apparatus for co-deposition of materials onto a substrate
US6364956B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 1999 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Jan 26, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC40B60/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.