Process for producing a sensor membrane substrate
US6365055B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 1999 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | May 26, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/86
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process for producing a sensor membrane substrate, in particular, for a mass flow sensor or a pressure sensor, the substrate having on its front a membrane, which is fixed at the edge of an opening that is etched free from the back. The process includes the following steps: providing a substrate; local thickening the substrate in an area on the front opposite the edge, the thickened portion having a continuous transition to the substrate; depositing a membrane layer on the front having the locally oxidized area; and etching free the opening from the back to clear the membrane in such a way that the edge is located underneath the thickened area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.