Microwave processing in pure H fields and pure E fields
US6365885B1 · kind B1 · utility
35Cited by
40References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 2000 |
| Grant date | Apr 2, 2002 |
| Priority date | — |
| Expiry date | Oct 18, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B2206/046
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments include a process including providing a microwave radiation source and a processing chamber. The process includes generating a region of pure magnetic field from the microwave radiation in the processing chamber. A region of pure electric field from the microwave radiation is also generated. A material is positioned in the region of pure magnetic field while no portion of the material is positioned in the region of pure electric field, and the material is heated in the region of pure magnetic field. The heating may be conducted to sinter the material. The material may includes a metal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.