View port of a chemical vapor deposition device for manufacturing semiconductor devices
US6367415B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2001 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Mar 8, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B7/007
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A view port of chemical vapor deposition apparatus for manufacturing semiconductor devices prevents heat loss in a chamber during a plasma deposition process. The view port includes a bracket protruding at the circumference of an opening in an electrode serving as a wall of a chamber of the apparatus, a transparent window pressed by the bracket against the wall via an O-ring, a pivoting cap for capping an opening in the bracket aligned with the window, and heat-insulative material and/or a heating element integral with the cap so as to be positioned close to the window when the cap is closed. The heating element can be a resistive heating wire or a warm air duct formed by a hose or the like. During the deposition process, the temperature of the window is maintained, thereby minimizing the tendency of polymer to adhere to the window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.