Etching method and a method of manufacturing a magnetic head
US6368519B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 1999 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Dec 9, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A magnetic gap is formed to be vertical to the film forming surface of a substrate with high accuracy by a simple method. The method comprises a non-magnetic film forming step of forming a non-magnetic film made of the non-magnetic material on the substrate, a high selectivity film forming step of forming a high selectivity film made of a material which has a higher selectivity ratio with respect to reactive ion etching than the non-magnetic material, on the non-magnetic film formed, a patterning step of patterning the high-selectivity film into a predetermined shape, and an etching step of etching the non-magnetic film by reactive ion etching, using the high selectivity film as a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.