Tungsten film, method of manufacturing the same, and thin-film heater
US6368729B1 · kind B1 · utility
0Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2000 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Sep 27, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1284
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention provides a thin-film heater having a high heat-resisting property and a high resistivity and suitable for low power consumption and for a compact and fine structure, and a method of manufacturing this thin-film heater.A thin-film heater contains a tungsten film formed on a substrate, and this tungsten film generates heat when a current is supplied to this tungsten film. The tungsten film is formed by an RF sputtering method, and is constructed of tungsten having peaks at approximately 36 degrees, 40 degrees and 44 degrees in Bragg angle 2&thgr; of X-ray diffraction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.