Method of determining accuracy error in line width metrology device
US6369891B1 · kind B1 · utility
5Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 2, 1999 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Jul 2, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2814
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of determining the accuracy error in scanning signals of a semiconductor line width metrology device comprises the steps of creating a frequency signature template of a patterned feature formed on a semiconductor layer with a line width metrology measurement device that is in nominal operating condition. Another patterned feature similar to the first patterned feature is scanned and the waveform signal is generated of the line width patterned feature. The waveform signal is processed and converted into a frequency signature which is compared with the frequency signature template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.