Electrostatic sensing chuck using area matched electrodes
US6370005B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 1999 |
| Grant date | Apr 9, 2002 |
| Priority date | — |
| Expiry date | Oct 14, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is an electrostatic sensing chuck for attracting particles to a portion of a particle contact surface near a deposition electrode, the electrostatic sensing chuck comprising a pixel comprising: a deposition electrode (DE) for selectively establishing an attraction field (Ea) at the particle contact surface; a shield electrode (SE) oppositely biased with respect to the deposition electrode; a charge sensing circuit to measure charge accumulated on each of the deposition electrode and the shield electrode, wherein the charge sensing circuit subtracts a second charge it senses at the shield electrode from a first charge it senses at the deposition electrode, thereby determining accumulated charge at the deposition electrode balanced by accumulated charge at the shield electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.