Patent · US Expired

Process for oxidizing the H2S contained at low concentration in a gas directly to sulphur by catalytic means and in the vapour pause

US6372193B1 · kind B1 · utility

11Cited by
4References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 24, 2000
Grant dateApr 16, 2002
Priority date
Expiry dateMay 24, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S502/514
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for catalytically oxidizing H2S contained in a gas directly to sulphur containing the following steps: combining the H2S-containing gas with a gas containing free oxygen in an amount to produce an oxygen-enriched H2S-containing gas having O2/H2S molar ratio ranging from about 0.05 to about 15; and contacting the oxygen-enriched H2S-containing gas with a catalyst for selective oxidation of H2S to sulphur, wherein the catalyst includes a catalytically active phase combined with a silicon carbide-based support and wherein the active phase of the catalyst consists of at least one oxysulphide of at least one metal selected from the group consisting of iron, copper, nickel, cobalt, chromium, molybdenum and tungsten, at a temperature above the dew point of sulphur formed during H2S oxidation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.