Shaping irradiance profiles using optical elements with positive and negative optical powers
US6373633B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 6, 2000 |
| Grant date | Apr 16, 2002 |
| Priority date | — |
| Expiry date | Jul 6, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0961
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multi-aperture irradiation profile shaping system is presented that uses at least one arrangement of at least three apertures associated with a plurality of optical elements, wherein at least one optical element has positive optical power and another one element has negative optical power. The system may be implemented with the apertures in one, two, or three dimensions. The system yields a predetermined arbitrary irradiation profile on a target. The shape of the apertures may be any one of square, rectangular, and hexagonal. The shape of the apertures may also be asymmetric so that a rotation of the aperture shape by 180 degrees around an axis perpendicular to the surface of the aperture yields an inverted aperture shape. The system may be implemented with apertures having symmetric and asymmetric shapes that allow nearly 100% fill factor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.