Heat-developable photosensitive material
US6376166B1 · kind B1 · utility
7Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2000 |
| Grant date | Apr 23, 2002 |
| Priority date | — |
| Expiry date | Mar 30, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C7/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat-developable photosensitive material which comprises, on the same side of a support, at least (a) a photosensitive silver halide, (b) a reducible silver salt, (c) a phenol compound represented by the following general formula (1), (d) a binder, and (e) a coupler compound: wherein V1 to V8 each independently represent a hydrogen atom or a functional group; L represents a bridging group consisting of —CH(V9)— or —S—; V9 represents a hydrogen atom or a functional group. The heat-developable photosensitive material causes extremely low fog and is suitable for photomechanical reproduction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.