Patent · US Expired

Compositions for films having a low refractive index

US6376572B1 · kind B1 · utility

35Cited by
12References
13Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 1, 2000
Grant dateApr 23, 2002
Priority date
Expiry dateJun 1, 2020

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09D151/003
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Use of a composition for preparing by radical route polymeric films having refractive index lower than 1.400, said composition comprising:a) a perfluoropolyether of formula:T′—Rf.T  (Ia)b) from 0.1 to 10% by weight of a perfluoropolyether of formula:T—Rf—CH2OH  (Ib)c) from 0 to 30% by weight of compounds selected from c1):compounds not containing fluorine: non fluorinated (meth)acrylic esters or vinyl monomers;or c2) compounds containing fluorine: mono(meth)acrylate perfluoropolyethers or perfluoroalkyl mono(meth)acrylates,d) from 0.01 to 10% by weight of a photoinitiator and/or radical initiators,the amount of component a) being the complement to 100 of the composition, with the proviso that defining by B0 the mole number of —CF2CH2OH and by B1 the sum of the moles of the (meth)acrylic end groups, the (B0+B1)/B1 ratio is in the range 1.50-1.01.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.