Moving exposure system and method for maskless lithography system
US6379867B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2000 |
| Grant date | Apr 30, 2002 |
| Priority date | — |
| Expiry date | Jan 10, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithography system and method for providing a mask image to a subject such as a wafer is provided. The mask images are divided into sub-patterns and sequentially provided to a pixel panel, such as a deformable mirror device or a liquid crystal display. The pixel panel converts each sub-pattern into a plurality of pixel elements. Each of the pixel elements is then simultaneously focused to discrete, non-contiguous portions of the subject through a microlense array. The subject and pixel elements are then moved (e.g., one or both may be moved) and the next sub-pattern in the sequence is provided to the pixel panel. As a result, light can be projected on the subject, according to the pixel elements, to create a contiguous image on the subject.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.