Patent · US Expired

Method and apparatus for the construction of photosensitive waveguides

US6379873B1 · kind B1 · utility

2Cited by

5References

29Claims

0Family size

Assignee

Unisearch Limited · AU

Inventors

Michael Bazylenko · Forbes, AU
David L. Moss · Austin, US
Mark Gross · Santa Fe Springs, US
Pak Lim Chu · Sydney, AU

Key dates

Filing date	Dec 22, 1998
Grant date	Apr 30, 2002
Priority date	—
Expiry date	Dec 22, 2018

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/136
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

There is disclosed a method of constructing photosensitive waveguides on silicon wafers through the utilization of a Plasma Enhanced Vapor Deposition (PECVD) system. The deposition is utilized to vary the refractive index of resulting structures when they have been subject to Ultra Violet (UV) post processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.