Patent · US Expired

Using block copolymers as supercritical fluid developable photoresists

US6379874B1 · kind B1 · utility

31Cited by

9References

7Claims

0Family size

Assignee

Cornell Research Foundation, Inc. · US

Inventors

Christopher K. Ober · Ithaca, US
Jianguo Wang · Horseheads, US

Key dates

Filing date	Oct 16, 2000
Grant date	Apr 30, 2002
Priority date	—
Expiry date	Oct 16, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0045
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Block copolymers containing block having pendant fluoro-containing groups and block having pendant hydrolyzable ester containing groups is developed at lower pressures and temperatures than random copolymers of the same monomers. Where the block with ester groups is from polymerization of 2-tetrahydropyranyl methacrylate and the block with pendant fluoro-containing groups is from polymerization of perfluoroalkyl methacrylate or semifluorinated alkyl methacrylate, resolution of sub 0.3 &mgr;m features is enabled.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.