Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass
US6380110B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2000 |
| Grant date | Apr 30, 2002 |
| Priority date | — |
| Expiry date | Jan 14, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/54
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.