Patent · US Expired

Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass

US6380110B1 · kind B1 · utility

23Cited by
4References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 14, 2000
Grant dateApr 30, 2002
Priority date
Expiry dateJan 14, 2020

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2203/54
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.