Cleaning process and composition
US6380149B2 · kind B2 · utility
21Cited by
45References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 2001 |
| Grant date | Apr 30, 2002 |
| Priority date | — |
| Expiry date | May 29, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/34
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A process for removing contaminants from the surface of a substrate comprises contacting the substrate with a cleaning composition comprising at least one mono-, di-, or trialkoxy-substituted perfluoroalkane, perfluorocycloalkane, perfluorocycloalkyl-containing perfluoroalkane, or perfluorocycloalkylene-containing perfluoroalkane compound, the compound optionally containing additional catenary heteroatoms. The compounds exhibit good solvency properties while being environmentally acceptable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.