Method for forming a thin film
US6383358B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2001 |
| Grant date | May 7, 2002 |
| Priority date | — |
| Expiry date | Mar 16, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49115
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A first reactive solution is made of a water solution composed of LiOH.7H2O melted in distilled water, and a second reactive solution is made of a water solution composed of CoSO4.7H2O melted in distilled water. Then, the first and the second reactive solutions are put in a flow-type reactor with a pair of electrodes and a porous base material provided in between the pair of electrodes therein. The first reactive solution is flown in between one electrode and the porous base material at its given flow rate, and the second reactive solution is flown in between the other electrode and the porous base material at its given flow rate. Then, a given voltage is applied between the pair of electrodes to synthesize a compound thin film including the components of the first and the second reactive solutions directly on the porous base material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.