Method for purifying a tantalum compound using a fluoride compound and sulfuric acid
US6383459B1 · kind B1 · utility
13Cited by
9References
8Claims
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Key dates
| Filing date | Aug 31, 2000 |
| Grant date | May 7, 2002 |
| Priority date | — |
| Expiry date | Aug 31, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/82
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A direct dissolution method for the purification of technical grade hydrated ammonium tantalum oxide (HATO), (NH4)2−xHxTa2O6.nH2O), and related compounds such as tantalum hydroxide and tantalum oxide is described. The method preferably uses ammonium bifluoride as fluoride source in place of the hydrofluoric acid used in the conventional methods. Other fluoride compounds such as NaF, KF, and CaF2 may be used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.